Planar KBTEM
Belarus
| Technologies, equipment and materials for electronic manufacturing | Microelectronics Equipment |
Pavilion 3 Hall 15
Stand No- D3101
Laser-based opto-mechanical and inspection and measurement equipment for microelectronics and MEMS fabrication:
• photomask fabrication equipment (pattern generators, pattern inspection systems, pattern repair systems),
• photolithography equipment (maskless pattern generators, wafer steppers, proximity exposure tools),
• inspection and inspection-and-measurement tools (CD inspection and micro defect inspection tools),
• pre-assembly die equipment (wafer probing equipment, wafer grinders, dicing saws),
• assembly equipment (automatic die bonders, wire bonders, assembly inspection tools),
• microscopy (microscopes, automated micro inspection stations),
• test equipment (electromagnetic compatibility, electrical safety, moisture protection, fire safety).
• EM-6129 Unpatterned Wafer Defect Inspection System;
• EM-5079 High Throughput Pattern Generator with Spatial Light Modulation / Multi-beam i-line Laser Pattern Generator;
• EM-5279 DUV Laser Pattern Generator with Optical Proximity Correction;
• EM-6729K Automatic Mask Pattern Defect Inspection System (chrome mask, half tone mask and/or protective layer inspection configurations);
• EM-5231 Extra-large Mask Pattern Laser Defect Repair System.